首页> 外国专利> Electron-emitting device having focus coating that extends partway into focus openings

Electron-emitting device having focus coating that extends partway into focus openings

机译:具有聚焦涂层的电子发射装置,该聚焦涂层部分地延伸到聚焦孔中

摘要

An electron-emitting device contains an electron focusing system (37 or 37A) formed with a base focusing structure (38 or 38A) and a focus coating (39 or 39A) that penetrates partway into a focus opening (40) extending through the base focusing structure above an electron- emissive element (24). The focus coating is normally of lower resistivity than the base focusing structure and thereby provides most of the focus control over electrons emitted by the electron-emissive element. The focus coating is typically formed by an angled deposition technique.
机译:电子发射装置包括形成有基础聚焦结构(38或38A)和聚焦涂层(39或39A)的电子聚焦系统(37或37A),该聚焦涂层部分地穿透到延伸穿过基础聚焦的聚焦开口(40)中电子发射元件(24)上方的结构。聚焦涂层通常具有比基础聚焦结构低的电阻率,从而对由电子发射元件发射的电子提供大部分聚焦控制。聚焦涂层通常通过成角度的沉积技术形成。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号