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Tin-silver alloy electroplating bath and tin-silver alloy electroplating process

机译:锡银合金电镀液及锡银合金电镀工艺

摘要

Disclosed is a tin-silver alloy electroplating bath containing: (A) stannous sa (B) silver sa (C) one kind or two or more kinds of acids selected from the group consisting of sulfuric acid, phosphoric acid, phosphonic acid, hydroxycarboxylic acid, alkanesulfonic acid, and alkanolsulfonic acid; (D) thiourea; (E) nonionic surface active agent; and (F) one kind or two or more kinds of additives selected from the group consisting of a mercapto group containing aromatic compound, dioxyaromatic compound, and unsaturated carboxylic acid. The electroplating using the above electroplating bath is allowed to form a homogeneous tin-silver alloy plated film having a good external appearance by eliminating preferential deposition of silver and substitutional deposition of silver on an anode and the plated film.
机译:公开了一种锡银合金电镀浴,其包含:(A)亚锡盐; (B)银盐; (C)选自硫酸,磷酸,膦酸,羟基羧酸,链烷磺酸和链烷醇磺酸中的一种或两种以上的酸; (D)硫脲; (E)非离子表面活性剂; (F)选自包含巯基的芳香族化合物,二氧芳香族化合物和不饱和羧酸的一种或两种以上。通过消除优先沉积银和在阳极和电镀膜上银的替代沉积,允许使用上述电镀浴进行电镀以形成具有良好外观的均匀的锡-银合金电镀膜。

著录项

  • 公开/公告号US6099713A

    专利类型

  • 公开/公告日2000-08-08

    原文格式PDF

  • 申请/专利权人 C. UYEMURA & CO. LTD.;

    申请/专利号US19970977658

  • 发明设计人 ISAMU YANADA;MASANOBU TSUJIMOTO;

    申请日1997-11-24

  • 分类号C25D3/56;

  • 国家 US

  • 入库时间 2022-08-22 01:36:30

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