首页> 外国专利> Process and diffusion baffle to modulate the cross sectional distribution of flow rate and deposition rate

Process and diffusion baffle to modulate the cross sectional distribution of flow rate and deposition rate

机译:工艺和扩散挡板可调节流量和沉积速率的横截面分布

摘要

Process and apparatus controlling the cross-sectional flow distribution within a flowing stream such as a copper flux in an electrolytic copper deposition process. The flow distribution is controlled by a baffle comprised of two plates overlying one another, each having a set of openings, wherein the openings in the two plates generally correspond to one another but are slightly offset therefrom or varied in size in a non-uniform way along the radius of the plates such as to effect a modification of the uniformity or non-uniformity of the velocity flow rates across the cross section of the flowing stream in which the baffle is interposed.
机译:在电解铜沉积工艺中控制诸如铜焊剂之类的流动物流内的截面流分布的工艺和装置。流量分布由一个挡板控制,该挡板包括彼此叠置的两个板,每个板具有一组开口,其中两个板中的开口通常彼此相对应,但彼此略有偏移或尺寸不均匀地变化沿板的半径方向移动,以便改变横穿隔板的流动流的横截面的流速的均匀性或不均匀性。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号