Abatement methods and abatement systems for the semiconductor manufacturing exhaust gas

摘要

PROBLEM TO BE SOLVED: To provide a equipment for eliminating damage for off-gas which can correspond to a multi-chamber type CVD with a single equipment, and has simple structure and small installation area, and provide a method for damage eliminating the off-gas which is able to eliminate damages safely, even if the installation area of the equipment is small. ;SOLUTION: This equipment for eliminating damage is provided with a plurality of independent damage eliminating equipment units which are connected with respective chambers 1 of a CVD 2, having a plurality of the chambers 1 by the use of an independent piping 4, and an exit scrubber 10 for collecting the gas treated with the damage eliminating equipment units and cleaning and cooling the gas together. The damage eliminating equipment units are provided with entrance scrubbers 5 and reaction cylinders as heating oxidizing decomposing zones 7.;COPYRIGHT: (C)1999,JPO