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Three-dimensional non-contact non-volatile memory cell and method of manufacturing the same

机译:三维非接触式非易失性存储单元及其制造方法

摘要

A three-dimensional contactless non-volatile memory cell is described. The memory cell comprises a substrate, source/drain regions that function as buried bit-lines and define a channel therebetween, a floating gate disposed above and insulated from the channel, and a control gate disposed above and insulated from the floating gate. The floating gate is formed to an adequate thickness so as to allow capacitive coupling to the control gate along the vertical regions of the floating gate. Thus, a reduction in minimum cell size can be achieved by decreasing the lateral dimensions of the cell without compromising the total capacitive coupling area. Subsequently, a substantial reduction in the total array area and a corresponding increase in device density can be realized. Further features of the invention include elimination of thick oxide regions in the array and improved gate oxide quality.
机译:描述了三维非接触式非易失性存储单元。该存储单元包括衬底,用作掩埋位线并在其间限定沟道的源/漏区,设置在沟道上方并与其绝缘的浮栅,以及设置在浮栅上方并与其绝缘的控制栅。浮栅形成为足够的厚度,以允许沿着浮栅的垂直区域电容耦合至控制栅。因此,可以通过减小电池的横向尺寸而不减小总电容耦合面积来实现最小电池尺寸的减小。随后,可以实现总阵列面积的显着减小和器件密度的相应增加。本发明的其他特征包括消除阵列中的厚氧化物区域和改善的栅极氧化物质量。

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