首页> 外国专利> Professional - bu device and professional - bu manner

Professional - bu device and professional - bu manner

机译:专业-布装置和专业-布方式

摘要

PURPOSE: To miniaturize a probe device adopting a mechanism, which makes projecting pins project by the rotation of a placement stage to lift up a wafer. ;CONSTITUTION: A probe device is provided with a rotating mechanism, which rotates a placement stage 2 to perform an alignment of probes 14 with a wafer 1, and moreover, a protrusion part 6, which rotates the stage 2 by 20° from a reference positional angle to make projecting pins 5 project, the stage 2 is rotated by ±7° in its circumferential direction to align the probes 14 with an electrode on the wafer, a probing inspection is made, the stage 2 is further rotated 20° in its circumferential direction, whereby the pins 5 are made to project from the surface of the stage 2 to make the wafer 1 separate from the surface of the stage 2 and the wafer 1 is transferred to a transfer arm.;COPYRIGHT: (C)1995,JPO
机译:用途:为了使采用一种机构的探针装置小型化,该机构通过放置台的旋转使突出的销突出以提起晶片。组成:探针装置具有旋转机构,该旋转机构使放置台2旋转以使探针14与晶片1对准,此外,突出部6使台2旋转20°。从基准位置角度使突出销5突出,使载物台2旋转±7°。在其圆周方向上使探针14与晶片上的电极对准,进行探测检查,将载物台2进一步旋转20°。沿其圆周方向,使销钉5从平台2的表面突出,以使晶片1与平台2的表面分离,并将晶片1转移到传送臂上。版权所有:(C) 1995年

著录项

  • 公开/公告号JP3188892B2

    专利类型

  • 公开/公告日2001-07-16

    原文格式PDF

  • 申请/专利权人 東京エレクトロン株式会社;

    申请/专利号JP19940124507

  • 发明设计人 鈴木 勝;

    申请日1994-05-13

  • 分类号H01L21/66;G01R1/073;

  • 国家 JP

  • 入库时间 2022-08-22 01:34:22

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号