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PHASE ADJUSTING MASK FOR ARRAY WAVEGUIDE GRATING AND MANUFACTURING METHOD FOR ARRAY WAVEGUIDE GRATING USING IT

机译:阵列波导光栅相位调整模板及阵列波导光栅制造方法

摘要

PROBLEM TO BE SOLVED: To simultaneously adjust phase errors of each waveguide in an array waveguide grating.;SOLUTION: Although the length of each array waveguide in the array waveguide grating 2 is basically increased at a fixed pitch, the phase errors actually exist in each array waveguide after manufacture. Thereupon, each waveguide is irradiated with ultraviolet laser beams 10 via the window 9 of a phase adjusting mask 11, and the phase of each waveguide is controlled by the use of the change of ultraviolet ray inducing refractive index. Moreover, since the window 9 is formed into the length corresponding to a phase every each waveguide the phase of all waveguides can be matched to a design value only by irradiating each waveguide with the ultraviolet laser beam 10 once.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:为了同时调整阵列波导光栅中每个波导的相位误差。解决方案:尽管阵列波导光栅2中每个阵列波导的长度基本上以固定的间距增加,但实际上每个阵列中都存在相位误差。制造后的阵列波导。随即,经由相位调节掩模11的窗口9向每个波导照射紫外线激光束10,并通过利用紫外线诱导折射率的变化来控制每个波导的相位。此外,由于窗口9被形成为与每个每个波导的相位相对应的长度,因此仅通过对每个波导照射紫外线激光束10一次就可以使所有波导的相位与设计值匹配。;版权:(C)2001 ,日本特许厅

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