The reticule amendment the glass lens error in the photolithographic system

摘要

(57) Abstract The reticule (130) to offer image pattern in the photolithographic system and amendment glass lens error. This reticule is adjusted structurally making use of the gap data of the image which shows glass lens error. The reticule can be adjusted structurally by for example adjusting the chrome pattern of the surface of the quartz substrate by adjusting the configuration (or layout) of the emission transmitted field (132 and 134). Replacing to this, the reticule for example offers chrome pattern to the surface of the quartz substrate by adjusting the curvature of the reticule, at the same time rubs the portion of the base of the quartz substrate and can be adjusted structurally by taking. The gap data of the image in order amendment glass lens heating where the reticule is annexed to reticule patterning, can also change as a function of glass lens heating.