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Electric charge beam arrangement and process manner null for profile processing observation

机译:电荷束的布置及处理方式无效,用于剖面加工观察

摘要

PURPOSE: To work a transmission electron microscope sample in a specified position of a sample into a simple and more suitable form, and observe and analyze it in the site. ;CONSTITUTION: An ion optical system for emitting a converged ion beam 3 to a sample 4 from the transverse direction to the electron beam 7 of a transmission electron microscope is arranged, and a transmission type electron microscope sample is formed by ion beam etching. The secondary electrons by excitation of the beams 2, 7 are detected by a secondary electron detector 5 to confirm the working position, working form and section of the sample. The electron beam 7 transmitted by the sample 4 is detected by a transmitted electron detector 12 to observe a fine part. The X-ray by electron beam cooling is detected by an X-ray detector 10 to analyze the fine part.;COPYRIGHT: (C)1994,JPO&Japio
机译:目的:将透射电子显微镜样品在样品的指定位置加工成简单且更合适的形式,并在现场进行观察和分析。组成:配置了一个离子光学系统,用于从透射电子显微镜的电子束7的横向向样品4发射会聚的离子束3,并且通过离子束蚀刻形成透射型电子显微镜样品。由二次电子检测器5检测由束2、7的激发引起的二次电子,以确认样品的工作位置,工作形式和截面。由样品4透射的电子束7由透射电子检测器12检测以观察细小部分。电子射线冷却的X射线由X射线检测器10检测以分析细小部分。版权:(C)1994,JPO&Japio

著录项

  • 公开/公告号JP3132938B2

    专利类型

  • 公开/公告日2001-02-05

    原文格式PDF

  • 申请/专利号JP19930016633

  • 发明设计人 岩崎 浩二;

    申请日1993-02-03

  • 分类号H01J37/30;H01J37/244;H01J37/28;

  • 国家 JP

  • 入库时间 2022-08-22 01:32:36

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