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NEW GENERATING AGENT OF ORGANOSILYL FREE RADICAL AND ITS APPLICATION

机译:新型有机自由基聚合物及其应用

摘要

PROBLEM TO BE SOLVED: To obtain a new compound generating an organosilyl free radical by light irradiation.;SOLUTION: This compound is represented by the formula (I) (wherein, R1, R2 and R3 are each H, a 1-20C alkyl, a 3-6C alkenyl, phenyl or the like; R1 and R2 may be a 2-9C alkylene, o-xylylene, 2-butenylene, a 3-9C oxalkylene or the like as combination; R4, R5, R6 and R7 are each a sec-3-20C alkyl, tert-4-20C alkyl or the like; R4 and R5 and/or R6 and R7 may be each a 2-9C alkylene, o-xylylene, 2-butenylene or the like as combination; R4 and R6 and/or R5 and R7 may be each a blanched 2-9C alkylene, o-xylylene, 2-butenylene or the like as combination).;COPYRIGHT: (C)2001,JPO
机译:解决的问题:为了获得通过光照射产生有机甲硅烷基自由基的新化合物;解决方案:该化合物由式(I)表示(其中,R 1,R 2和R 3分别为H,1-20C烷基, 3-6C烯基,苯基等; R1和R2可以是2-9C亚烷基,邻二甲苯基,2-丁烯基,3-9C氧亚烷基等的组合; R4,R5,R6和R7分别是sec-3-20C烷基,叔-4-20C烷基等; R4和R5和/或R6和R7可以各自为2-9C亚烷基,邻二甲苯基,2-丁烯基等的组合; R4 R 6和/或R 5和R 7可以分别为2-9C的亚烷基,邻二甲苯基,2-丁烯基等的组合。)版权所有:(C)2001,JPO

著录项

  • 公开/公告号JP2001220396A

    专利类型

  • 公开/公告日2001-08-14

    原文格式PDF

  • 申请/专利权人 CIBA SPECIALTY CHEM HOLDING INC;

    申请/专利号JP20000360941

  • 发明设计人 MATSUMOTO AKIRA;ITO YOSHIHIKO;

    申请日2000-11-28

  • 分类号C07F19/00;B01J13/02;C07F7/02;C07F7/10;C08F2/48;C09D4/00;C09D5/00;C09D11/02;C09J4/00;G03F7/029;

  • 国家 JP

  • 入库时间 2022-08-22 01:32:27

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