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DEVELOPMENT PROCESSING DEVICE FOR MATERIAL HAVING PHOTOSENSITIVE RESIN COMPOSITION

机译:具有光敏树脂组合物的材料开发加工装置

摘要

PROBLEM TO BE SOLVED: To provide a development processing device for material having a photosensitive resin composition capable of lessening the amount of waste liquid while maintaining the development performance of a development processing liquid.;SOLUTION: This development processing device 10 includes an intermediate waste liquid tank 2 into which the overflow waste liquid from a developing bath 4 is introduced, an electrolytic cell 1 which electrolytically treats the liquid used for development introduced from the developing bath 4 and the overflow waste liquid introduced from the intermediate waste liquid tank 2. The electrolytic cell 1 includes a circulating mechanism consisting of a first route for circulating the liquid used for development between a cathode side of this electrolytic cell and the developing bath 4 and a second route for circulating the overflow waste liquid between an anode side of the electrolytic cell and the intermediate waste liquid tank 2.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:提供一种用于显影材料的显影处理装置,该材料具有感光性树脂组合物,该材料能够减少废液量,同时保持显影处理液的显影性能。解决方案:该显影处理装置10包括中间废液。从显影槽4引入的溢流废液被引入到槽2中,电解池1对从显影槽4引入的用于显影的液和从中间废液槽2引入的溢流槽进行电解处理。电解槽1包括循环机构,该循环机构包括用于使用于显影的液体在该电解池的阴极侧与显影槽4之间循环的第一路径和用于使溢出的废液在电解池的阳极侧与第二电解槽之间循环的第二路径。中间废液罐2 .;版权所有:(C)2 001,日本特许厅

著录项

  • 公开/公告号JP2001166498A

    专利类型

  • 公开/公告日2001-06-22

    原文格式PDF

  • 申请/专利权人 FUJI PHOTO FILM CO LTD;

    申请/专利号JP19990348907

  • 发明设计人 OISHI CHIKASHI;FURUKAWA KOJI;

    申请日1999-12-08

  • 分类号G03F7/30;C02F1/46;G03F7/00;

  • 国家 JP

  • 入库时间 2022-08-22 01:31:49

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