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Improved electrode null for high current density die plasma arc

机译:改进的零电极设计,可实现高电流密度的等离子弧

摘要

The diameter of a hafnium insert (44) press fit into the bottom end of a copper electrode (42) varies as a function of the level of a current carried by the electrode. The diameter is the minimum necessary to support emission at that current level while also protecting the copper body against attack by the arc. The insert (44) is generally circular and preferably extends completely through the bottom wall (42g) to a circulating flow of cooling water at a hollow interior (48) of the electrode. The bottom wall includes an annular recess (42d) in a portion of the copper wall surrounding the insert. A coolant tube (56) extends into the recess in a spaced relationship to provide a high flow velocity of the coolant over the interior rear surface of the electrode.
机译:压入铜电极(42)底端的insert插入物(44)的直径随电极承载的电流水平而变化。直径是在该电流水平下支持发射并保护铜体免受电弧侵蚀所需的最小直径。插入件(44)通常是圆形的,并且优选地完全穿过底壁(42g)延伸到电极的中空内部(48)处的冷却水的循环流。底壁在围绕插件的铜壁的一部分中包括环形凹槽(42d)。冷却剂管(56)以隔开的关系延伸到凹部中,以在电极的内部后表面上方提供冷却剂的高流速。

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