METHOD AND DEVICE FOR MEASURING THICKNESS BY PHOTOTHERMAL ANALYSIS OF MATERIAL LAYER AND COMPUTER PROGRAM FOR PHOTOTHERMAL ANALYSIS

摘要

PROBLEM TO BE SOLVED: To provide a method and a device for photothermal analysis of materials layers, especially for thickness measurement thereof and also provide a computer program for photothermal analysis. ;SOLUTION: This device with the first layer of the materials which is a reference layer and the second layer which is a materials layer to be analyzed is for photothermal analysis, especially for the thickness measurement and is realized by the method with a computer program which consists of exciting the surface of the first layer of the materials by electromagnetic radiation, detecting the thermal radiation from the surface with the first temperature response curve, exciting the surface of the second layer of the materials, detecting the thermal radiation from the surface with the second temperature response curve. The extension factor is defined between the first and the second temperature response curves, and the extension factor is used as a fixed value of the rate between the materials layer for which the extension factor is analyzed and the reference layer.;COPYRIGHT: (C)2001,JPO