首页> 外国专利> TREATMENT PROCESS OF LIQUID WASTE OF DEVELOPER/FIXER FOR DEVELOPING PHOTOGRAPH SUCH AS X-RAY PHOTOGRAPH AND LIQUID WASTE OF ANTIFREEZING FLUID OR THE LIKE

TREATMENT PROCESS OF LIQUID WASTE OF DEVELOPER/FIXER FOR DEVELOPING PHOTOGRAPH SUCH AS X-RAY PHOTOGRAPH AND LIQUID WASTE OF ANTIFREEZING FLUID OR THE LIKE

机译:X射线摄影显影液/定影液的液体废液的处理过程,以及强化液体或类似液体的废液处理。

摘要

PROBLEM TO BE SOLVED: To reutilize liquid waste of a developer and a fixer, each used for developing a photograph such as X-ray photograph, and liquid waste of an antifreezing fluid or the like, without discharging such liquid waste as effluent by detoxifying the liquid waste and solidifying the detoxified liquid waste.;SOLUTION: In this treatment process for detoxifying such liquid waste and solidifying the detoxified liquid waste, there is such a problem that since the pH value of the liquid waste of a developer or antifreezing fluid is greatly different from that of a fixer, the liquid waste of the developer or antifreezing fluid must separately be treated from the liquid waste of the fixer. Also, while a portland cement-based solidifying agent is capable of easily solidifying such liquid waste even at a high pH value, an alumina cement-based solidifying agent can appropriately be used for solidification of such liquid waste at a pH value of ≤7. Thus, the treatment process involves treating the liquid waste of the developer or antifreezing fluid with a normal portland cement-based solidifying agent and treating the liquid waste of the fixer with an alumina cement-based solidifying agent, to solve the above problem.;COPYRIGHT: (C)2001,JPO
机译:要解决的问题:为了重新利用显影剂和定影剂的废液,它们各自用于显影照片(例如X射线照片)和防冻液等的废液,而不会通过排毒而将其作为废水排放解决方案:在该用于对这种废液进行解毒并固化该脱毒的废液的处理过程中,由于显影剂或防冻液的废液的pH值很大,因此存在一个问题。与定影剂不同,显影剂或防冻液的废液必须与定影剂的废液分开处理。而且,尽管波特兰水泥基固化剂即使在高pH值下也能容易地固化这种废液,但是氧化铝水泥基固化剂可以适当地用于在pH值≤7的情况下固化这种废液。 。因此,该处理过程涉及用普通的硅酸盐水泥基固化剂处理显影剂或防冻液的废液,并用氧化铝水泥基固化剂处理定影剂的废液,以解决上述问题。 :(C)2001,日本特许厅

著录项

  • 公开/公告号JP2001232349A

    专利类型

  • 公开/公告日2001-08-28

    原文格式PDF

  • 申请/专利权人 FUJIMASU JIRO;FUJIMASU HIROKO;

    申请/专利号JP20000095834

  • 发明设计人 FUJIMASU JIRO;

    申请日2000-02-25

  • 分类号C02F1/00;C04B18/04;G03C5/00;

  • 国家 JP

  • 入库时间 2022-08-22 01:30:00

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