首页> 外国专利> COATING COMPOSITION FOR PREVENTING DEPOSITION OF SNOW AND ICE AND FORMATION OF COATING FILM FOR PREVENTING DEPOSITION OF SNOW AND ICE

COATING COMPOSITION FOR PREVENTING DEPOSITION OF SNOW AND ICE AND FORMATION OF COATING FILM FOR PREVENTING DEPOSITION OF SNOW AND ICE

机译:防止雪和冰沉积的涂料组合物和防止雪和冰沉积的涂料膜的形成

摘要

PROBLEM TO BE SOLVED: To obtain a coating composition which can give a high-hardness coating film excellent in the ability to prevent the deposition of ice and snow by mixing at least one member selected from an organosilane having a specified structure, a hydrolyzate thereof, and a condensate thereof with at least one polymer comprising specified structural units and containing silyl groups bonded to hydrolyzable groups and/or hydroxyl groups. ;SOLUTION: This composition comprises 100 pts.wt. (A) at least one member selected from an organosilane represented by formula I, such as a trialkoxysilane, a hydrolyzate thereof, and a condensate thereof and 20-800 pts.wt. polymer comprising structural units (B) or (C) represented by formula II or III and having silyl groups having a silicon atom bonded to hydrolyzable groups and/or hydroxyl groups. Component A is a product obtained by the hydrolysis and condensation of a mixture of 0.5-3 mol of water with 1 mol of an organosilane. In the formulae, R1 is a 1-8C monovalent hydrocarbon group; R2 is a 1-5C alkyl or a 1-6C acyl; R3 to R5 are each CmY2m+1; Y is H, F, or Cl; Rf is a fluoroalkyl or the like; n is 0-2; and m is 0-5.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:通过混合选自具有特定结构的有机硅烷中的至少一种,其水解产物,获得一种涂料组合物,该涂料组合物可以提供具有优异的防止冰和雪沉积能力的高硬度涂膜,以及其与至少一种聚合物的缩合物,所述聚合物包含特定的结构单元并且包含与可水解基团和/或羟基键合的甲硅烷基。 ;解决方案:该成分包括100pts.wt。 (A)选自式I表示的有机硅烷的至少一种,例如三烷氧基硅烷,其水解产物和其缩合物,其含量为20-800pts.wt。聚合物,其包含由式II或III表示的结构单元(B)或(C),并且具有甲硅烷基,该甲硅烷基具有与可水解基团和/或羟基键合的硅原子。组分A是通过将0.5-3摩尔的水与1摩尔的有机硅烷的混合物水解和缩合而获得的产物。式中,R 1为1〜8C的1价烃基。 R 2为1-5C烷基或1-6C酰基; R3至R5分别为CmY2m + 1; Y为H,F或Cl; Rf为氟代烷基等。 n为0-2;并且m为0-5 。;版权所有:(C)2001,日本特许厅

著录项

  • 公开/公告号JP2001040338A

    专利类型

  • 公开/公告日2001-02-13

    原文格式PDF

  • 申请/专利权人 JSR CORP;

    申请/专利号JP19990214264

  • 发明设计人 SAKAGAMI TOSHIKI;SHIMADA JIYUNSEISHI;

    申请日1999-07-28

  • 分类号C09K3/18;C08L83/04;C09D5/00;C09D183/04;

  • 国家 JP

  • 入库时间 2022-08-22 01:29:55

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