Proximity effect amendment manner, SCALPEL (registered trade mark (registration number 4274961))Exposure device, and SCALPEL (registered trade mark (registration number 4274961))Mask

摘要

PROBLEM TO BE SOLVED: To provide a proximity effect correcting method wherein, responding to the pattern to be formed on a wafer, its exposure amount (does) can be adjusted. ;SOLUTION: A SCALPEL mask 10 has an electron transmitting portion 11, and has an electron scattering portion 12 of a desired mask pattern formed on its front surface side. Further, the SCALPEL mask 10 has a mesh-form scatterer 13 formed on its rear surface side. This mesh-form scatterer 13 can screen one portion of a current. The mesh of this mesh-form scatterer 13 is formed in the size in whose extent the pattern of the mesh is not formed on a wafer. Moreover, in the place of the wafer having a dense pattern, also the mesh is made dense, and in the place of the wafer having a coarse pattern, also the mesh is made coarse.;COPYRIGHT: (C)2000,JPO