FILM FORMATION PROCESS EVALUATING APPARATUS AND METHOD, COMPUTER-READABLE RECORDING MEDIUM WITH FILM FORMATION PROCESS EVALUATING PROGRAM STORED THEREON, AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a film formation process evaluating apparatus which can accurately determine film formation process conditions for formation of a deposited film in a semiconductor element or the like, and also to provide an evaluation program thereof. ;SOLUTION: Information about surface shape and film formation process time at a given measurement time on a deposited film is input to a velocity vector extraction part 113 via an input part 121. In a surface shape extracting part 114 and a film-formation event contribution rate extracting part 115, a contribution rate of each event is calculated on the basis of a physical event model associated with the film formation at a given point and kept in a storage part 116, together with its coordinate values. The surface shape extracting part 114 creates a surface shape, based on a set of given points, and a control part 112 sets a process time and outputs information on the latest contribution rate of the storage part 116 to an output part 122. The user sets film formation process conditions in a manufacturing conditions determination part 117 by referring to the last information, and sends the determination conditions to a semiconductor element manufacturing apparatus 123 to manufacture a semiconductor element on the basis of the conditions.;COPYRIGHT: (C)2001,JPO