首页> 外国专利> PRODUCTION OF HIGH-PURITY ASPARTIC ACID DIBENZYL ESTER- SULFONATE AND HIGH-PURITY ASPARTIC ACID DIBENZYL ESTER- SOLFONATE

PRODUCTION OF HIGH-PURITY ASPARTIC ACID DIBENZYL ESTER- SULFONATE AND HIGH-PURITY ASPARTIC ACID DIBENZYL ESTER- SOLFONATE

机译:高纯度ASPA酸二磺酸酯和高纯度磺酸二苯甲酸二酯的生产

摘要

PROBLEM TO BE SOLVED: To obtain an aspartic acid dibenzyl ester-sulfonate having high purity with simple procedure by purifying a crude aspartic acid dibenzyl ester-sulfonate in an organic solvent containing a specific amount of water. ;SOLUTION: The objective compound is produced by purifying (A) a crude aspartic acid dibenzyl ester-sulfonate of formula (R1 and R2 are each H, a 1-4C lower alkyl, a 1-4C lower alkoxy or a halogen; R3 is H or a 1-3C lower alkyl and the substitution position may be ortho, meta or para; (n) is 0-2) is (B) an organic solvent containing ≥2 times mol of water based on the component A. The purification procedure of the component A depends upon the content of water-soluble impurities. For example, when the component A contains only a small amount of water-soluble impurities, the procedure is carried out by suspending the component in an organic solvent, adding ≥2 times mol of water based on the component A while stirring the suspension at a prescribed temperature, cooling the product, separating the precipitated crystal by filtration and drying the crystal.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:通过在含有特定量的水的有机溶剂中纯化粗制的天冬氨酸二苄基酯磺酸盐,以简单的步骤获得具有高纯度的天冬氨酸二苄基酯磺酸盐。 ;解决方案:目标化合物是通过提纯(A)式(R1和R2分别为H,1-4C低级烷基,1-4C低级烷氧基或卤素)的天冬氨酸二苄基酯磺酸盐制备的; R3为H或1-3C的低级烷基,取代位置可以是邻位,间位或对位;(n)为0-2)是(B)一种有机溶剂,基于组分A含有≥2摩尔的水。组分A的纯化程序取决于水溶性杂质的含量。例如,当组分A仅包含少量水溶性杂质时,通过将组分悬浮在有机溶剂中,基于组分A添加≥2倍摩尔的水,同时在室温下搅拌该悬浮液来进行该程序。规定温度,冷却产物,过滤分离沉淀的晶体,干燥晶体。版权所有:(C)2000,JPO

著录项

  • 公开/公告号JP2000319239A

    专利类型

  • 公开/公告日2000-11-21

    原文格式PDF

  • 申请/专利权人 TORAY IND INC;

    申请/专利号JP19990130619

  • 发明设计人 SATO HARUYO;ONO TAKAE;

    申请日1999-05-11

  • 分类号C07C229/24;C07B63/00;C07C227/40;C07B303/44;C07B309/30;

  • 国家 JP

  • 入库时间 2022-08-22 01:29:07

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