METHOD FOR MANUFACTURING PLASMA REACTIVE REGION STRUCTURE, PLASMA REACTIVE REGION STRUCTURE, AND PLASMA PROCESSOR USING THE STRUCTURE

摘要

PROBLEM TO BE SOLVED: To realize a durable structure such as a plasma generating container or plasma reactor used in a plasma etching system or a plasma reactive region of a CVD system by solving a problem in productivity and maintenance with a very short lifetime of quartz glass and that the structure has been eroded by fluoric gas. ;SOLUTION: A protective film of dense and rigid alumina or the like is formed over quartz glass which is a preprocessing reactive region structure by the atomic layer chemical vapor deposition method or the CVD method. The protective film is constituted of at least one or more substances. A plasma reactive region structure used in a plasma reactive region of a plasma etching system or a CVD system, which used to be eroded by a fluoric gas, turns nonerosive. Therefore, it proves to improve durability, to increase productivity, and to be effective in cost and maintenance.;COPYRIGHT: (C)2001,JPO