首页> 外国专利> Composite, processes of stabilization of a material subject to actinic radiation degradation, and of protection of a substrate against actinic radiation degradation, composition of coating suitable for the formation of a stabilized pellet against acclimatised radiation degradation, composition of stabilisation of actnic radiation, photographic material, and, cosmetic composition

Composite, processes of stabilization of a material subject to actinic radiation degradation, and of protection of a substrate against actinic radiation degradation, composition of coating suitable for the formation of a stabilized pellet against acclimatised radiation degradation, composition of stabilisation of actnic radiation, photographic material, and, cosmetic composition

机译:复合材料,经受光化辐射降解的材料的稳定过程以及保护基材免受光化辐射降解的过程,适合于形成稳定粒料以抵抗环境辐射降解的涂层组成,光化辐射的稳定组成,照相材料以及化妆品成分

摘要

"Compound, stabilisation of a material which is subject to degradation by radiation actu00ecnica, and protection of a substrate against degradation by radiation actu00ecnica,Revestimetno composition suitable for the formation of a pelu00eccula stabilized against degradation by radiation actu00ecnica, composition of stabilization of the radiation actu00ecnica, photographic equipment, and.The cosmetic composition.This invention relates to a general way to pyrimidines and triazines substituted by fenila para tertiary alkyl and its use in protection against degradation by environmental forces,Including actinic radiation of ultraviolet light, oxidation, moisture, air pollutants, and combinations of these.The new class of pyrimidines and triazines substituted by fenila para tertiary alkyl includes two groups of fenila alkylated tertiary.And a group of resorcinol or resorcinol substituted triazine or pyrimidine linked to the ring.These materials may, under the appropriate circunstu00e2nicas be nations formulations comprising coatings, polymers, resins,Organic compounds and others through the reaction of the functionality vinculable with materials of the formulation.A process for stabilizing a material by incorporation of such pyrimidines and triazines substituted by fenila para tertiary alkyl is also presented.
机译:化合物,受辐射作用降解的材料的稳定化,以及保护基质不受辐射作用降解的作用,适用于形成经抗辐射作用降解而稳定的骨盆的Revestimetno组合物。本发明涉及由芬尼拉对叔烷基取代的嘧啶和三嗪的一般方法及其在防止环境力降解中的用途,包括紫外线,氧化,湿气,空气污染物的光化辐射,这些污染物的组合以及它们的组合。被芬尼拉对叔叔烷基取代的新型嘧啶和三嗪包括两组芬尼拉烷基化叔叔,以及一组间苯二酚或间苯二酚取代的三嗪或嘧啶这些材料可能会在适当的情况下 u00e2通过可与该涂料材料相容的官能团的反应,由涂料,聚合物,树脂,有机化合物等组成的涂料。 。

著录项

  • 公开/公告号BR9911401A

    专利类型

  • 公开/公告日2001-03-20

    原文格式PDF

  • 申请/专利权人 CYTEC TECHNOLOGY CORP.;

    申请/专利号BR19999911401

  • 发明设计人 RAM B. GUPTA;DENNIS J. JAKIELA;

    申请日1999-06-18

  • 分类号C07D251/24;C07D251/22;C07D239/26;C08K5/3492;G03C1/73;A61K7/42;

  • 国家 BR

  • 入库时间 2022-08-22 01:25:58

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