Ultraviolet laser apparatus such as excimer laser apparatus, controls supply of xenon gas of preset concentration to chamber which contains argon/neon gas and fluorine gas

摘要

Xenon gas of predetermined concentration is supplied from xenon gas cylinder (15) to predetermined amount of gases stored in chamber (10) so that burst phenomenon and spike phenomenon occurring in ultraviolet laser output are reduced. A sensor (16) detects concentration of xenon gas supplied to the chamber based on which the xenon gas supply is controlled by a controller (18). The gases for ultraviolet lasers includes argon/neon gas and fluorine gas from respective gas cylinders (13,14). An independent claim is also included for ultraviolet lasers.