PH ADJUSTED NONIONIC SURFACTANT-CONTAINING ALKALINE CLEANER COMPOSITION FOR CLEANING MICROELECTRONICS SUBSTRATES

摘要

AQUEOUS ALKALINE CLEANING SOLUTIONS FOR CLEANING MICROELECTRONIC SUBSTRATES AND MAINTAINING SUBSTRATE SURFACE SMOOTHNESS COMPRISE A METAL ION FREE BASE, A NONIONIC SURFACTANT AND A COMPONENT TO REDUCE OR CONTROL THE PH OF THE CLEANING SOLUTION TO A PH WITHIN THE RANGE OF FROM ABOUT PH 8 TO ABOUT PH 10.