MULTILAYER OPTICAL INTERFERENCE COATING OF COMPLEX CURVED SUBSTRATES

摘要

Precision multilayer optical interferencecoating of substrates having complex topology usingcomplementary shaped electrodes and plasma enhancedchemical vapor deposition within a chamber. Thematerials for the optical quality thin films areobtained from starting reactants of the form M-R whereM denotes a metal atom and R denotes an organiccomponent. These vapor phase starting reactants arebrought into a reactive atmosphere of the chamberthrough a plurality of orifices in one of the shapedelectrodes. The resulting substances are deposited asthin films upon the substrates with inherentlysuperior scatter loss performance because of the lowtemperature nature and simple direct vapor-to-solidphase transformation pith of the process.