COMPOSITION FOR CHEMICAL PURIFICATION OF SURFACES OFF ADSORBED METAL IONS AND ATOMS

摘要

The composition for chemical purification of surfaces off adsorbed metal ions and atoms is designed for chemical treatment in production technology where basic and auxiliary materials must meet strict requirements concerning purity, especially in case of chemical treatment of siliceous structures and AIII BV structures in semiconductor technology used before operations of epitaxial growth, oxidation, ion implementation, diffusion, annealing and application of thin metal or dielectric coats. According to the invention, the composition for chemical purification of surfaces off adsorbed metal ions and atoms consists of 0.1 - 20 units of weight of sulphomaleic anhydride, 0.1 - 50 units of weight of disulphomaleic anhydride, which is used in the composition as an activator of change of water molecule in cation hydration sheath during formation of chelate and water. It is most effective if used in the amount of 0.1 - 2 units of weight of the composition to purify siliceous plates before thermal process, and in the amount of 10 - 20units of weight of the composition to purify diffusive pipes.