- OXYGEN-ARGON GAS MIXTURE FOR PRECLEANING IN VACUUM PROCESSING SYSTEM

摘要

A method for cleaning, pre-cleaning process objects such as substrates uses process gases such as argon mixed with oxygen. The process gas sputter etches the material from the surface of the process object. Oxygen reacts with the etched material and stoichiometrically balances deposition in a smooth film on the process kit. Process kits are periodically removed and replaced after processing or cleaning a predetermined number of process objects.