DEPOSITION CHAMBER HAVING SEPARATOR FOR PREVENTING CONTAMINATION OF TARGET SURFACES AND SHUTTER FOR PREVENTING CONTAMINATION OF SUBSTRATES FOR MULTI-COMPONENT DEPOSITION

摘要

PURPOSE: A deposition chamber having a separator for preventing contamination of target surfaces and a shutter for preventing contamination of substrates for multi-component deposition is provided to increase quality of a thin film by simply solving demerits generated during working process in a physical vapor deposition equipment. CONSTITUTION: The deposition chamber having a separator for preventing contamination of target surfaces and a shutter for preventing contamination of substrates for multi-component deposition comprises a substrate holder(44) which is rotated using a driving handle(41) of the outer part of a deposition tank(45), both ends of which are fastened and closely adhered to the upper ends of the deposition tank(45) by screws, and into which a plurality of holes are perforated so as to use a plurality of substrates, wherein a substrate shaped groove having a certain depth is formed on a part to be contacted with a substrate(43) so as to fix the substrate(43) into the groove; a shutter(10) which is mounted on underneath the substrate holder(44) inside the deposition tank, and at the central part of which a screw hole is formed for mounting and dismounting a driving shaft and a cover of the deposition tank, and a deposition hole for depositing a desired material by exposing a substrate to be deposited is formed so that the shutter(10) is rotated by a driving unit(42) coupled to the driving shaft; and a separator(20) which separates two or more cathode bodies(46) so as to prevent contamination of target surfaces of the cathode bodies(46) using a lower partition, and in which a hole having a diameter slightly larger than a target diameter is perforated into an upper cover in such a way that the hole is on the line perpendicular to the target surface.