Procedure for production of micro-mechanical structures such as rotation sensors has extra protective layer deposition and etching steps to protect the structure during processing of the reverse side of the substrate

摘要

Procedure has the following steps: formation of a micro-mechanical structure (B1-B3) on the front surface (VS) of a substrate (1); deposition of a protective layer (S) on the structure; machining of a further micro-mechanical structure on the rear side (RS) of the substrate, which is supported by the forward side structure; removal of the protective layer. Optional further machining of either front or rear side can be undertaken after the above steps.