首页> 外国专利> A method for producing a high volts is suitable, in the case of an edge termination according to the principle of the lateral charge compensation, prefabricated base material wafer

A method for producing a high volts is suitable, in the case of an edge termination according to the principle of the lateral charge compensation, prefabricated base material wafer

机译:在根据侧向电荷补偿的原理进行边缘终止的情况下,一种适合于产生高电压的方法是预制基材晶片

摘要

The invention relates to a method for producing an edge termination, which is capable of handling high voltages, in a base material wafer prefabricated according to the principle of lateral charge compensation. The edge termination (4) is placed in the prefabricated base material wafer by implanting a rapidly diffusing dopant such as, in particular, selenium or sulfur.
机译:本发明涉及一种在根据横向电荷补偿原理预制的基材晶片中产生能够处理高压的边缘终端的方法。通过注入快速扩散的掺杂​​剂,例如特别是硒或硫,将边缘终端(4)放置在预制的基材晶片中。

著录项

  • 公开/公告号DE19942679C1

    专利类型

  • 公开/公告日2001-04-05

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE1999142679

  • 发明设计人 SCHULZE HANS-JOACHIM;DEBOY GERALD;

    申请日1999-09-07

  • 分类号H01L29/06;

  • 国家 DE

  • 入库时间 2022-08-22 01:10:19

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