Unit to generate plasma in receptacle holding sample or component to be treated; has thin-walled electrode connected to generator and arranged in receptacle filled with processing gas to ignite plasma

摘要

The unit has an electrode (5) arranged in the receptacle (2) to ignite a plasma, where the receptacle is filled with a processing gas. The electrode is connected to a generator. The electrode is thin-walled with a wall-thinner than 1 mm. The electrode may be a plate or a hollow contour, with the sample (4) inside or outside the electrode. The generator preferably generates an alternating voltage of 50-60 Hz without electrical control.