首页> 外国专利> Projection lens e.g. for photolithography during semiconductor manufacture, has double aspherical lens spaced from image plane by more than maximum lens diameter

Projection lens e.g. for photolithography during semiconductor manufacture, has double aspherical lens spaced from image plane by more than maximum lens diameter

机译:投影镜头用于半导体制造过程中的光刻,其双非球面透镜与像面的间距大于最大透镜直径

摘要

The projection lens has at least 5 different lens groups (G1-G5), each provided with a number of lens surfaces, at least 2 of the lens surfaces lying adjacent one another for providing a double aspherical lens (21), which is positioned at a minimum distance from the image plane (0') of greater than the maximum lens diameter.
机译:投影透镜具有至少5个不同的透镜组(G1-G5),每个透镜组都具有多个透镜表面,至少两个透镜表面彼此相邻,以提供双非球面透镜(21),该透镜位于距像平面(0')的最小距离大于最大透镜直径。

著录项

  • 公开/公告号DE10119861A1

    专利类型

  • 公开/公告日2001-11-08

    原文格式PDF

  • 申请/专利权人 CARL ZEISS;

    申请/专利号DE2001119861

  • 发明设计人 SINGER WOLFGANG;SCHUSTER KARL-HEINZ;

    申请日2001-04-24

  • 分类号G02B15/00;

  • 国家 DE

  • 入库时间 2022-08-22 01:09:32

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