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Projection lens e.g. for photolithography during semiconductor manufacture, has double aspherical lens spaced from image plane by more than maximum lens diameter
Projection lens e.g. for photolithography during semiconductor manufacture, has double aspherical lens spaced from image plane by more than maximum lens diameter
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机译:投影镜头用于半导体制造过程中的光刻,其双非球面透镜与像面的间距大于最大透镜直径
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摘要
The projection lens has at least 5 different lens groups (G1-G5), each provided with a number of lens surfaces, at least 2 of the lens surfaces lying adjacent one another for providing a double aspherical lens (21), which is positioned at a minimum distance from the image plane (0') of greater than the maximum lens diameter.
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