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Particle size distribution for wet bed processes for the production of alkyl halosilanes
Particle size distribution for wet bed processes for the production of alkyl halosilanes
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机译:用于生产烷基卤硅烷的湿床工艺的粒度分布
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摘要
The process for the mfr. of alkylhalosilanes of formula (I) comprises contacting an alkyl halide of formula (II) with a fluidised bed of particulate Si at 250-350 (270-320) deg.C in the presence of a catalyst compsn. which includes Cu. The novelty is that the Si particles are within a range of 1-85 microns, and pref. have a particle size mass distribution characterised by a 10th percentile of 2.1-6 (2.5-4.5) microns; a 50th percentile of 10-25 (12-25) microns; and a 90th percentile of 30-60 (35-45) microns. RaHbSiX4-a-b (I) RX (II) R is 1-4C alkyl; X is halogen; a is 1, 2, 3 or 4; b is 0, 1 or 2; provided a+b is 1, 2, 3 or 4.
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