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Particle size distribution for wet bed processes for the production of alkyl halosilanes

机译:用于生产烷基卤硅烷的湿床工艺的粒度分布

摘要

The process for the mfr. of alkylhalosilanes of formula (I) comprises contacting an alkyl halide of formula (II) with a fluidised bed of particulate Si at 250-350 (270-320) deg.C in the presence of a catalyst compsn. which includes Cu. The novelty is that the Si particles are within a range of 1-85 microns, and pref. have a particle size mass distribution characterised by a 10th percentile of 2.1-6 (2.5-4.5) microns; a 50th percentile of 10-25 (12-25) microns; and a 90th percentile of 30-60 (35-45) microns. RaHbSiX4-a-b (I) RX (II) R is 1-4C alkyl; X is halogen; a is 1, 2, 3 or 4; b is 0, 1 or 2; provided a+b is 1, 2, 3 or 4.
机译:制造过程。式(I)的烷基卤硅烷的制备包括在催化剂组合物的存在下,使式(II)的烷基卤化物在250-350(270-320)℃下与颗粒状Si的流化床接触。其中包括铜。新颖之处在于Si颗粒在1-85微米的范围内,优选。具有以2.1-6(2.5-4.5)微米的百分之十为特征的粒度质量分布; 10-25(12-25)微米的第50个百分点;和30-60(35-45)微米的第90个百分位数。 RaHbSiX4-a-b(I)RX(II)R为1-4C烷基; X是卤素; a是1,2,3或4; b是0、1或2;假设a + b为1、2、3或4。

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