Plasma emission spectroscopy analysis includes formation of solution with sample, and gassing solution to create plasma for analysis

摘要

the system includes formation of a solution containing the sample, and conversion into gas for analysis within a plasma chamber. The analysis method includes dissolving the sample in a bath containing an etching reagent, and then heating the resulting solution. This leads to a gaseous discharge which is then fed into a plasma in order to measure the intensity of the emission lines. The apparatus includes an inert gas source, a plasma torch and a spectrometer which is connected to a measuring system. A container (B) is equipped with an inlet from the inert gas source (Ar) and a system (E) for introducing a sample, and an inlet for the etching solution (SE). This container has an outlet connected to the plasma torch for analysis.