首页>
外国专利>
Oxonol compound, light-sensitive material and process for the synthesis of oxonol compound
Oxonol compound, light-sensitive material and process for the synthesis of oxonol compound
展开▼
机译:恶草酚化合物,光敏材料和合成恶草酚化合物的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
An oxonol compound is represented by the following formula (I) : ##STR1## in which Z is an atomic group that forms a cyclic amide ring; each of W.sup.1 and W.sup.2 independently is an atomic group that forms an acidic nucleus ring; and M is a cation. Other oxonol compounds, a light-sensitive material containing an oxonol compound and a process for the synthesis of an oxonol compound are also disclosed.
展开▼