首页> 外国专利> Process and compositions for nitration of n-nitric acid at elevated temperatures to form HNIW and recovery of gamma HNIW with high yields and purities and crystallizations to recover epsilon HNIW crystals

Process and compositions for nitration of n-nitric acid at elevated temperatures to form HNIW and recovery of gamma HNIW with high yields and purities and crystallizations to recover epsilon HNIW crystals

机译:用于在高温下硝化正硝酸以形成HNIW的方法和组合物以及以高收率和纯度回收伽马HNIW的方法和结晶以回收εHNIW晶体

摘要

Processes and compositions for nitration of N-substituted isowurtzitane compounds with concentrated nitric acid at elevated temperatures to form HNIW and recovery thereof with high yields and purities. Polymorphic conversions to the epsilon HNIW crystal form at quanititative yields are also described.
机译:在高温下用浓硝酸硝化N-取代的异丁烯二烷化合物以形成HNIW的方法和组合物,并以高收率和纯度回收。还描述了以定量产率向εHNIW晶体形式的多晶型转化。

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