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Surface polishing method and apparatus wherein axis of autorotation of workpiece is revolved about an axis within circumscribed circle of the workpiece

机译:表面抛光方法和设备,其中工件的自转轴绕工件外接圆内的轴旋转

摘要

Surface polishing system adapted to polish, lap or grind a surface of a workpiece in a plane such that the workpiece is held in sliding contact with a polishing face of a rotating polishing plate, wherein the workpiece is rotated by a work rotating device about an autorotation axis thereof which is parallel to an axis of rotation of the polishing plate and which lies within the surface of the workpiece, and the autorotation axis of the workpiece is revolved by a work revolving device about a revolving axis which is parallel to the axis of rotation of the polishing plate and which lies within a circumscribed circle of the surface of the workpiece.
机译:适用于在平面上抛光,研磨或研磨工件表面的表面抛光系统,以使工件与旋转抛光板的抛光面保持滑动接触,其中工件通过工件旋转装置围绕自动旋转旋转平行于抛光板的旋转轴并且位于工件表面内的其轴线,以及工件的自转轴线通过工件旋转装置绕平行于旋转轴线的旋转轴线旋转。抛光板的半径位于工件表面的外接圆之内。

著录项

  • 公开/公告号US6280296B1

    专利类型

  • 公开/公告日2001-08-28

    原文格式PDF

  • 申请/专利权人 NORITAKE CO. LTD.;

    申请/专利号US19990450775

  • 申请日1999-11-30

  • 分类号B24B10/00;

  • 国家 US

  • 入库时间 2022-08-22 01:03:28

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