Production method of the application liquid for silica type tunic formation, the application liquid for silica type tunic formation, production method of silica type tunic, the semiconductor device null where silica type tunic and silica type tunic were formed

摘要

PURPOSE:To obtain a coating fluid for forming a silica film, which scarcely causes nonuniformity in coating and can form an insulating film of high flatness by dissolving at least two specified alkoxysilane compounds in specified organic solvents to cause hydrolysis and polycondensation. CONSTITUTION:In the synthesis of a siloxane polymer by the hydrolysis and polycondensation of at least two alkoxysilane compounds shown by the general formula: R4-nSi(OR')n (wherein R is 1-3C alkyl or aryl; R' is 1-3C alkyl; (n)is an integer of 2 to 4), at least two polar solvents different in boiling point are used so that at least three solvents are present including alcohol produced as the result of the hydrolysis. It is desirable to use a mixture of at least three solvents including the produced alcohol, selected in such a manner that, when arranged in the order of their boiling points, they are different in boiling point by at most 10 deg.C from one another.