Quality management method of a crystalline semiconductor film, the crystalline semiconductor film quality management for computer software, crystalline silicon film, a semiconductor device and a thin film transistor

摘要

PROBLEM TO BE SOLVED: To rapidly and accurately evaluate the film-quality control of a crystalline semiconductor film with an in-line process, for control to stabilize the process for manufacturing a semiconductor device. ;SOLUTION: A peak waveform 21 of a Raman band, corresponding to phonons that is characteristic to a semiconductor is measured by the Raman spectral method for the crystalline semiconductor film formed on a substrate, a waveform 21H at a high-frequency side is compared with a waveform 21H at a low-frequency side from the reference peak wavenumber, and the degree of asymmetry is judged, thus controlling the quality of the film. For example, peak areas 25H and 25L may be compared, peak widths may be compared, or an intensity value at a constant wavenumber point from a reference peak wavenumber may be compared for a waveform at a high-frequency side and that at a low-frequency side.;COPYRIGHT: (C)1998,JPO