首页> 外国专利> METHOD FOR CONSTRUCTING CUTOFF WALL AND METHOD FOR PREVENTING CRACKS IN CUTOFF WALL

METHOD FOR CONSTRUCTING CUTOFF WALL AND METHOD FOR PREVENTING CRACKS IN CUTOFF WALL

机译:防渗墙的构造方法和防裂墙的裂缝的方法

摘要

PROBLEM TO BE SOLVED: To provide a method for constructing a cutoff wall which prevents occurrence of shrinkage cracks per se in order to withstand sharp increase in groundwater level, and to provide a method for preventing cracks in the existing cutoff wall constructed by using bentonite slurry.;SOLUTION: The method for constructing the cutoff wall 9 is comprised of the following steps. In the first step, the bentonite slurry prepared by mixing ethanol, water, and bentonite with each other, is injected into strata (1, 3, 5) through which the cutoff wall is constructed, and earth and sand in the ground are agitatingly mixed with the injected bentonite slurry, followed by arranging the resultant mixture so as to have a desired cutoff wall shape, to thereby form a wall structure 7. In the following step, mound 8 for applying a load on the wall structure 7 is formed directly on the wall structure 7.;COPYRIGHT: (C)2002,JPO
机译:要解决的问题:提供一种构造防渗墙的方法,该防渗墙本身可以防止收缩裂缝的发生,以承受地下水位的急剧上升,并且提供一种防止在使用膨润土浆料构造的现有防渗墙中形成裂纹的方法。解决方案:构造防渗墙9的方法包括以下步骤。在第一步中,将通过将乙醇,水和膨润土相互混合而制备的膨润土浆液注入构造隔断墙的地层(1、3、5)中,并搅拌混合地面中的土和沙用注入的膨润土浆料,然后将所得混合物布置成具有所需的截止壁形状,从而形成壁结构7。在随后的步骤中,直接在其上形成用于在壁结构7上施加载荷的土墩8。墙壁结构7 .;版权所有:(C)2002,日本特许厅

著录项

  • 公开/公告号JP2002266345A

    专利类型

  • 公开/公告日2002-09-18

    原文格式PDF

  • 申请/专利权人 SHIMIZU CORP;

    申请/专利号JP20010066744

  • 发明设计人 ASADA MOTOYUKI;HORIUCHI SUMIO;

    申请日2001-03-09

  • 分类号E02D5/18;

  • 国家 JP

  • 入库时间 2022-08-22 01:00:31

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