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Production manner and quantum thin line in quantum thin line and uses that the quantum effective component

机译:量子细线中的生产方式和量子细线及其使用的量子有效成分

摘要

PURPOSE: To provide a quantum fine line and a quantum effect element using thereof, having electronic stability and less crystal deffects and improved mechanical strength, which can be processed easily and can be manufactured at low cost. ;CONSTITUTION: A tapered stripe-like protruding part 11, consisting of the silicon similarly to a substrate, is formed by oxidizing at least the side face of the stripe-like part 111 and the silicon substrate by conducting an etching treatment in stripe form to the prescribed depth leaving the prescribed region of the silicon substrate 1 selectively, and a quantum fine line is manufactured.;COPYRIGHT: (C)1994,JPO&Japio
机译:用途:提供一种量子细线和使用其的量子效应元件,其具有电子稳定性和较少的晶体缺陷并具有改善的机械强度,其可以容易地加工并且可以低成本制造。 ;组成:类似于硅的由硅组成的锥形的带状突起部分11,是通过对带状部分111和硅衬底的至少一个侧面进行蚀刻处理,以条纹的形式进行氧化,从而形成的。规定深度选择性地离开硅衬底1的规定区域,并制造出量子细线。;版权所有:(C)1994,JPO&Japio

著录项

  • 公开/公告号JP3309461B2

    专利类型

  • 公开/公告日2002-07-29

    原文格式PDF

  • 申请/专利权人 ソニー株式会社;

    申请/专利号JP19920353180

  • 发明设计人 フイリップ オルディジス;

    申请日1992-12-11

  • 分类号H01L29/68;H01L29/06;

  • 国家 JP

  • 入库时间 2022-08-22 01:00:22

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