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The atom (fuse the semi-conducting material which is joined,) using it is low optical possesses the wavelength response range which is expanded level image detection device

机译:使用低光学的原子(融合的半导体材料)具有波长响应范围扩大的图像检测装置

摘要

An imaging device (10, 10') has a plurality of unit cells (11), that contribute to forming an image of a scene. The imaging device includes a layer of wide bandgap semiconductor (18) material (e.g., silicon) having photogate charge-mode readout circuitry (20, 22, 24), such as CCD or CMOS circuitry, disposed upon a first surface of the layer. In one embodiment a second, opposing surface of the layer is bonded at a heterojunction interface or atomic bonding layer (16) to a surface of a layer of narrower bandgap semiconductor material (e.g., InGaAs or HgCdTe), that is selected for absorbing electromagnetic radiation having wavelengths longer than about one micrometer (i.e., the NIR or longer) and for generating charge carriers. The generated charge carriers are transported across the heterojunction interface for collection by the photogate Charge-mode readout circuitry. The layer of narrower bandgap material may be disposed upon a surface of a transparent substrate, and also may be differentiated into a plurality of mesa structures (14a). In further embodiments the absorbing layer may have an equivalent or a wider bandgap than the layer having the readout circuitry. IMAGE
机译:成像装置(10、10')具有多个单位单元(11),其有助于形成场景的图像。该成像装置包括宽带隙半导体(18)材料层(例如,硅),该层具有布置在该层的第一表面上的诸如CCD或CMOS电路之类的光栅电荷模式读出电路(20、22、24)。在一个实施例中,该层的第二相对表面在异质结界面或原子键合层(16)处键合至较窄的带隙半导体材料(例如,InGaAs或HgCdTe)的层的表面,该材料被选择用于吸收电磁辐射。具有大于约一微米的波长(即,NIR或更长)的波长并且用于产生电荷载流子。产生的电荷载流子跨异质结界面传输,以通过光电门电荷模式读出电路进行收集。较窄的带隙材料层可以设置在透明基板的表面上,并且也可以区分为多个台面结构(14a)。在另外的实施例中,吸收层可以具有与具有读出电路的层相同或更大的带隙。 <图像>

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