High sensitivity method of detection and high sensitivity detection device null of the heavy metal in the silicon wafer

摘要

PROBLEM TO BE SOLVED: To provide a detection method and device for simply detecting heavy metal in a silicon wafer bulk with high sensitivity while eliminating a need for a pretreatment such as a heat treatment where a secondary contamination can easily occur. SOLUTION: By applying an electric field to the surface of a silicon wafer, heavy metal in a wafer bulk is condensed on a surface or near the surface, and then a condensation layer on the surface is subjected to heavy metal analysis using a method and device for detecting the heavy metal in the silicon wafer bulk with high sensitivity. In this case, a means for applying an electric field to the surface of the silicon wafer to condense the heavy metal in the wafer bulk on the surface or near the surface and a means for performing the heavy metal analysis of a wafer surface layer are provided in the method for detecting heavy metal in the silicon wafer bulk with high sensitivity.