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X-ray mask cleaning manner and x-ray mask cleaning device

机译:X射线口罩的清洁方式及x射线口罩的清洁装置

摘要

PURPOSE:To clean an X-ray mask without damaging it, by retaining a plurality of X-ray masks in a mask cassette, and cleaning the masks by forming a laminar flow of solution between a plurality of the X-ray masks. CONSTITUTION:X-ray masks 17 are set in a mask cassette 8, which is conveyed in a cleaning vessel 3. Chemical liquid in a circulation vessel 30 is loaded in the cleaning vessel 3 through a loading hole 27. The flowing direction of the loaded chemical liquid is limited, and a laminar flow 28 parallel to the mask surface is formed. As the result, large pressure is not applied to the mask surface, and cleaning is enabled without damaging the X-ray mask 17. Thereby the cleaning of an X-ray mask wherein the cleaning in the membrane state was difficult is enabled.
机译:目的:为了清洁X射线口罩而不损坏它,方法是将多个X射线口罩保留在口罩盒中,并通过在多个X射线口罩之间形成层流溶液来清洁口罩。组成:X射线掩膜17放置在一个掩膜盒8中,该掩膜盒在清洁容器3中输送。循环容器30中的化学液体通过一个装载孔27装载在清洁容器3中。限制化学液体,并形成平行于掩模表面的层流28。结果,没有对掩模表面施加大的压力,并且能够在不损坏X射线掩模17的情况下进行清洁。由此,能够进行膜状态下难以清洁的X射线掩模的清洁。

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