LASER OPTICAL SYSTEM USING PLURAL LASER BEAMS, AND LASER ANNEALING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an optical system for controlling a laser beam irradiation profile for forming a thin film having superior crystallinity necessary for manufacturing of a high-performance thin-film transistor, in a laser heat treatment method.;SOLUTION: The optical system for forming a liner beam shape on an amorphous or polycrystalline silicon film by forming the sectional intensity distribution of laser beams radiated from laser oscillators is so constituted, that the plural laser beams radiated from the plural laser oscillators are made uniform in the intensity distribution of a major axis direction by a beam intensity distribution forming means, and the top of the amorphous or polycrystalline silicon film formed on a substrate is irradiated with the linear beam shape. Irradiated area can be increased and productivity improved, in a state of maintaining the necessary irradiation intensity. The apparatus constitution is simplified, and the number of optical parts reduced.;COPYRIGHT: (C)2002,JPO