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Production manner null of manipulation shi -

机译:production manner null of manipulation是 -

摘要

PURPOSE:To facilitate the manufacture of a small quantity each of different types of operation sheet by using a photocurable resin consisting of a linear copolymer composed of alpha, beta unsaturated ethylene monomer and a monomer containing a carboxylic group as constituent units, a photopolymerable unsaturated compound and a photopolymerization initiator and exposing and developing the resin to form a projecting key top part. CONSTITUTION:One hundred pts.wt. of linear copolymer with a weight-average molecular weight of 200,000 to 500,000 consisting of 60 to 90wt.% of alpha, beta unsaturated ethylene monomer and 40 to 10weight% of a monomer containing a carboxylic group as constituent units, 5 to 150 pts.wt. of unsaturated compound expressed by formula I (R1, R2 are hydrogen; n is an integer of 1 to 15; X is a 2C to 20C divalent hydrocarbon group; and Y is a divalent organic group expressed by formula II (R3 is a 1C to 10C divalent hydrocarbon group; and n is an integer of 1 to 100)) and 0.1 to 10 pts.wt. of photopolymerable initiator which is sensitized due to an active light are components of a photocurable resin layer formed on a base sheet. In addition, a key top part is formed by exposing to light and developing the photocurable resin at a pressing position.
机译:目的:通过使用由α,β不饱和乙烯单体和含有羧基作为构成单元的单体组成的线性共聚物组成的可光固化树脂,可促进少量不同类型操作片的制造,可光聚合不饱和化合物以及光聚合引发剂,使树脂曝光并显影以形成突出的键顶部。组成:一百个pts.wt。 5至150 pts.wt的线性共聚物,其重均分子量为200,000至500,000,由60至90wt。%的α,β不饱和乙烯单体和40至10wt。%的含有羧基作为构成单元的单体组成。式I表示的不饱和化合物(R 1,R 2为氢; n为1至15的整数; X为2C至20C的二价烃基; Y为由式II表示的二价有机基团(R 3为1C至1C。 10C二价烃基;并且n是1至100)和0.1至10pts.wt的整数。由于活性光而敏化的光聚合引发剂是形成在基片上的光固化性树脂层的成分。另外,通过在压力位置处曝光并显影光固化性树脂来形成键顶部。

著录项

  • 公开/公告号JP3228762B2

    专利类型

  • 公开/公告日2001-11-12

    原文格式PDF

  • 申请/专利权人 積水化学工業株式会社;

    申请/专利号JP19910121231

  • 发明设计人 大塚 敏治;草野 哲也;丸山 耕司;

    申请日1991-05-27

  • 分类号B05D7/24;B05D1/32;C08F299/06;C09D4/06;H01H11/00;

  • 国家 JP

  • 入库时间 2022-08-22 00:58:45

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