MASK DATA CORRECTION DEVICE, FOURIER TRANSFORM DEVICE, UPSAMPLING DEVICE, DOWNSAMPLING DEVICE, METHOD FOR MANUFACTURING MASK FOR TRANSFER AND METHOD FOR MANUFACTURING DEVICE HAVING PATTERN STRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide a mask data correction device which can enhance the efficiency of processing while maintaining high accuracy by effectively utilizing the hierarchical structure of layout data. SOLUTION: A Fourie transform section 421 subjects the basic elements regulated by the layout data to Fourie transform to obtain the Fourie images based on the basic elements. A synopsis section 422 superposes the Fourie images of the basic elements within a Fourie space to obtain the Fourie images of the graphics over the entire part. A space filter section 423 subjects the Fourie images of the graphics over the entire part to the space filter processing corresponding to the distortion predicted in a manufacturing process. A reverse Fourie transform section 424 subjects the Fourie images after the space filter processing to reverse Fourie transform to obtain the reverse Fourie image reflecting the distortion. The graphics regulated by the layout data are compared with the graphics formed by transform of the reverse Fourie image and is corrected to a direction where the distortion is suppressed and is thereafter outputted as mask data.