FILM DEPOSITION SYSTEM, FILM DEPOSITION METHOD, AND MANUFACTURING METHOD FOR MULTI-LAYER REFLECTING MIRROR

摘要

PROBLEM TO BE SOLVED: To provide a film deposition system and a film deposition method, capable of easily controlling the film thickness distribution at a center part of a substrate and obtaining a desired film thickness distribution in a short time.;SOLUTION: In this film deposition system, atoms of a target are sputtered by heating the target or performing ion beam irradiation to the target in a sufficiently evacuated vessel, a substrate to be film-deposited having rotational- symmetric shape is rotated around the axis having rotational symmetry shape, a film thickness correction plate is disposed in the vicinity of the substrate, and the atoms are deposited on the substrate, and the film thickness correction plate has a plurality of apertures disposed at the spacing of not more than one half of the extension of penumbra of the film thickness correction plate in which particle lines are generated on the substrate during the film deposition in the vicinity of a part corresponding to the axis of rotational symmetry of the substrate, and an aperture with controlled aperture ratio in the radial direction.;COPYRIGHT: (C)2002,JPO