首页> 外国专利> CHARGED PARTICLE BEAM MICROSCOPE DEVICE, CHARGED PARTICLE BEAM APPLICATION DEVICE, CHARGED PARTICLE BEAM MICROSCOPIC METHOD, CHARGED PARTICLE BEAM INSPECTION METHOD AND ELECTRON MICROSCOPE

CHARGED PARTICLE BEAM MICROSCOPE DEVICE, CHARGED PARTICLE BEAM APPLICATION DEVICE, CHARGED PARTICLE BEAM MICROSCOPIC METHOD, CHARGED PARTICLE BEAM INSPECTION METHOD AND ELECTRON MICROSCOPE

机译:带电粒子束显微镜设备,带电粒子束应用设备,带电粒子束显微镜方法,带电粒子束检查方法和电子显微镜

摘要

PROBLEM TO BE SOLVED: To provide an electron microscope device using a short focus objective lens that enables acquiring a good image of high resolution without any distortion in a wide range from low magnification to high magnification at the observation in low acceleration voltage condition.;SOLUTION: In the electron microscope device that is constructed of an electron source 1, a focus lens 2, an upper stage deflection coil 4, a lower stage deflection coil 5, an objective lens 7, and a correction magnetic field lens 9 for electron beam deflection or the like, the distortion aberration that is generated in the objective lens 7 is cancelled by the reverse direction distortion aberration caused by the correction magnetic field lens 9 for electron deflection, and a good scanning electron microscopic image having a high resolution without any distortion in a wide range from low magnification to high magnification is obtained.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:提供一种使用短焦距物镜的电子显微镜装置,该装置能够在低加速电压条件下观察时从低倍率到高倍率的宽范围内获得良好的高分辨率图像,而没有任何畸变。 :在由电子源1,聚焦透镜2,上级偏转线圈4,下级偏转线圈5,物镜7和用于电子束偏转的校正磁场透镜9构成的电子显微镜装置中物镜7中产生的畸变像差被用于电子偏转的校正磁场透镜9引起的反方向畸变像差所抵消,并且高分辨率的良好扫描电子显微镜图像没有任何畸变。获得了从低倍率到高倍率的广泛范围。;版权所有:(C)2002,日本特许厅

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