首页> 外国专利> REVOLUTION FOCUSING TYPE ELECTRON BEAM IRRADIATION DEVICE

REVOLUTION FOCUSING TYPE ELECTRON BEAM IRRADIATION DEVICE

机译:革命性聚焦型电子束辐照装置

摘要

PROBLEM TO BE SOLVED: To provide an electron beam irradiation device allowing increase of treating efficiency by increasing hit probability to an irradiated body of an electron beam when the electron beam is applied to the extremely thin irradiated body to cure a resin applied to the surface.;SOLUTION: Electrons released from a negative electrode disposed in a vacuum region kept in a high vacuum state are accelerated between it and a positive electrode having an electron passing hole, and transmitted through an electron transmission window for taking them out of the vacuum region, and then the transmitted electrons are revolved around the irradiated body while decreasing revolution trajectory radius. Thus, many electrons are collided to the irradiated body. The electron density through the electron beam transmission window is decreased to prevent overheat of the electron beam transmission window to improve reliability.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:提供一种电子束照射装置,该电子束照射装置通过将电子束施加至极薄的被照射体以使施加于表面的树脂固化,从而通过增加对电子束的被照射体的命中概率来提高处理效率。 ;解决方案:从位于高真空状态的真空区域中的负极释放的电子在其与具有电子通过孔的正极之间加速,并通过电子传输窗口传输,以将其带出真空区域,然后,透射的电子围绕被辐照体旋转,同时减小旋转轨迹半径。因此,许多电子碰撞到被照射体上。通过电子束传输窗口的电子密度降低,以防止电子束传输窗口过热以提高可靠性。;版权所有:(C)2002,JPO

著录项

  • 公开/公告号JP2002214399A

    专利类型

  • 公开/公告日2002-07-31

    原文格式PDF

  • 申请/专利权人 ONO KATSUHIRO;

    申请/专利号JP20010007684

  • 发明设计人 ONO KATSUHIRO;

    申请日2001-01-16

  • 分类号G21K5/04;G21K5/00;G21K5/10;

  • 国家 JP

  • 入库时间 2022-08-22 00:55:58

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