首页> 外国专利> B-STAGE RESIN SHEET WITH DOUBLE-SURFACE TREATED COPPER FOIL SUITABLE FOR CARBON DIOXIDE LASER PERFORATION, AND PRINTED WIRING BOARD USING THE SAME

B-STAGE RESIN SHEET WITH DOUBLE-SURFACE TREATED COPPER FOIL SUITABLE FOR CARBON DIOXIDE LASER PERFORATION, AND PRINTED WIRING BOARD USING THE SAME

机译:B级树脂板,双表面处理的铜箔,适用于二氧化碳激光打孔,并使用相同的印刷线路板

摘要

PROBLEM TO BE SOLVED: To obtain a B-stage resin sheet with a copper foil which can be perforated by the direct irradiation with carbon dioxide laser.;SOLUTION: A sheet wherein a B-stage resin layer, which is obtained by applying a polyfunctional cyanic ester resin composition preferably compounded with 10-80 pts.wt. of an inorganic insulating filler to the opposite surface of a double-surface treated copper foil to which nickel treatment or nickel alloy treatment is preferably applied to dry the coating layer, is bonded on carbon dioxide laser irradiation side and the printed wiring board using this sheet are provided. The surface of the copper foil preferably subjected to nickel treatment or nickel alloy treatment of the copper clad sheet obtained using the sheet is directly irradiated with high output carbon dioxide laser of which the energy is preferably 10-60 mJ to process and remove outer and inner copper foil layers to form through-holes and/or blind viaholes with a pore size of 80-180 μm. Thereafter, the burr generated on the upper and rear surfaces of the copper foil and the inner copper layer and a part of the surface layer of the copper foil is removed by etching to adjust the thickness of the copper clad sheet to 2-7 μm. The copper clad sheet obtained by performing copper plating is used to form a high density printed wiring board. The B-stage resin sheet with the double-surface treated copper foil to which through-holes and/or blind viaholes can be formed by the direct irradiation with carbon dioxide laser can be obtained.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:获得具有铜箔的B阶段树脂片材,该片材可以通过用二氧化碳激光直接照射而穿孔。氰酸酯树脂组合物优选与10-80 pts.wt.混合。使用该片材,将无机绝缘填充剂粘结在优选经镍处理或镍合金处理以干燥涂层的双面处理铜箔的相对表面上,该铜箔粘结在二氧化碳激光照射侧和印刷线路板上。提供。使用能量优选为10-60mJ的高输出二氧化碳激光器直接辐照优选地对使用该板获得的覆铜板进行镍处理或镍合金处理的铜箔的表面,以处理和去除外部和内部。铜箔层以形成孔径为80-180μm的通孔和/或盲孔。此后,通过蚀刻除去在铜箔和内铜层的上,后表面和内铜层以及一部分铜箔的表面层上产生的毛刺,以将覆铜板的厚度调节为2-7μm。米通过进行镀铜而获得的覆铜板被用于形成高密度印刷线路板。可以得到具有经双面处理的铜箔的B阶树脂片,该铜箔可以通过用二氧化碳激光直接照射而形成通孔和/或盲孔。; COPYRIGHT:(C)2001,JPO

著录项

  • 公开/公告号JP2001347599A

    专利类型

  • 公开/公告日2001-12-18

    原文格式PDF

  • 申请/专利权人 MITSUBISHI GAS CHEM CO INC;

    申请/专利号JP20000169032

  • 发明设计人 IKEGUCHI NOBUYUKI;

    申请日2000-06-06

  • 分类号B32B15/08;H05K1/03;

  • 国家 JP

  • 入库时间 2022-08-22 00:55:46

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