METHOD FOR DEPOSITING FILM, METHOD FOR FABRICATING ELECTROOPTIC DEVICE, ELECTROOPTIC DEVICE, AND ATMOSPHERIC PRESSURE CVD SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a method for depositing a film on a substrate for mass production from the start, a method for fabricating a thin film transistor, a method for fabricating an electrooptic device, an electrooptic device, an electronic apparatus, and an atmospheric pressure CVD system.;SOLUTION: At the time of forming a BPSG film in an atmospheric pressure CVD system 100, a settling process is performed at first such that TES gas, TMOP gas and TEB gas, among film deposition gases, are supplied at a high concentration to a dispersion head 152 and O₃ gas is not supplied to the dispersion head 152. Subsequently, film deposition gas is supplied at a specified concentration to the dispersion head 152 in a film deposition process thus forming a BPSG film on a TFT array substrate 10.;COPYRIGHT: (C)2002,JPO